The introduction of plasmonic structure is a viable way for improving coupling of surface plasmons to improve the performance of optoelectronic devices. Here, by employing block-copolymer lithography and nano-imprinting lithography, we demonstrate a highly effective multiple pattern of polystyrene, silicon dioxide and polydimethylsiloxane, eventually for making a multiple pattern of metal (gold or aluminum) electrodes as back reflectors to fabricate solution-processable organic photovoltaics, organic photodiodes and organic phototransistors. The surface plasmon effects of metal electrodes as back reflectors allow significant additional light absorption compared with metal electrodes without the multiple pattern, leading to remarkable enhancements of power conversion efficiency of 13.8% in organic photovoltaics and external quantum efficiency enhancement of 20.4% in organic photodiodes as well as external quantum efficiency enhancement of 637.7% (at 100V under 532 nm of light) in organic phototransistors. These results demonstrate that the multiple patterns constitute a versatile and effective route for achieving high-performance organic optoelectronic devices.