Meeting the increasing requirements of high-tech applications in fast-growing markets, polymer-based molds and coatings experience on-going improvements. Consequently, the formulation of high-resolution photoresists with continuously decreased feature sizes has become a highly active topic of research. Photoresists can be cast on component surfaces and reproduce geometric patterns, which are set by masks during illumination, either in negative or positive fashion. In case of negative photoresists, crosslinking of polymers occurs during irradiation, yielding insoluble 2.5-dimensional surface structures. For the provision of highest-possible resolution, the photoresists’ adhesion on different substrates must be optimized considering the surface energy as well as the roughness. We recently developed a 2-oxazoline based copolymer with tailor-made properties in terms of surface energy and hydrophobicity. Preceded by the formulation of a water-developable photoresist [1;2], we hereby present the latest addition of our toolbox by a photoresist derived from renewable resources. The 2-oxazoline monomers to be used for the synthesis of the copolymer were synthesized from undecenoic acid (castor oil) or decanoic acid (coconut oil) and ethanol amine in solvent-free reactions. The polymerizations were performed under microwave irradiation in almost quantitative yields. Material characterization of the copolymer exhibited a high stability against acidic and alkaline media and good adhesion on various substrates (cross-hatch tests). Illumination through a mask aligner system enabled for the reproduction of geometric patterns with resolutions of 1 µm. [1] V. Schenk, L. Ellmaier, E. Rossegger, M. Edler, T. Griesser, G. Weidinger, F. Wiesbrock, Macromol. Rapid Commun. 2012, 33, 396. [2] F. Wiesbrock, F. Stelzer, V. Schenk, L. Ellmaier; Polymer Competence Center Leoben GmbH, Austria Technologie & Systemtechnik AG: WO 2013/036979.